Low metal, low particle solutions for research and development.
We contribute to measures against metal and particle contamination in semiconductor manufacturing.
In the field of research and development, the reproducibility of experiments is extremely important, and the contamination of impurities has a significant impact on experimental results. In the semiconductor manufacturing process, the contamination of metals and particles can lead to degradation of device performance and reduced yield, thus requiring a high level of cleanliness. Our low metal and low particle solutions address these challenges and contribute to improving reliability in research and development. 【Application Scenarios】 - Research and development of semiconductor materials - Evaluation of semiconductor manufacturing processes - Research where metal contamination and particle contamination are issues 【Effects of Implementation】 - Improved reliability of experimental data - Increased efficiency in research and development - Contribution to high-quality semiconductor manufacturing
- Company：福井キヤノンマテリアル
- Price：Other
